Hangzhou Garen Semiconductor Co., Ltd. is a technology-based enterprise that focuses on the research and development, production, and sales of wide bandgap semiconductor materials such as gallium oxide. The company relies on the National Key Laboratory of Silicon and Advanced Semiconductor Materials and the Zhejiang University Hangzhou International Science and Technology Innovation Center, and has formed a research and development, production, and operation team with rich industry experience, led by academicians of the Chinese Academy of Sciences. Garen Semiconductor Co., Ltd. leads industry innovation, successfully pioneering new technologies for gallium oxide single crystal growth such as casting method, and achieving breakthroughs in production technology for 6-inch single crystal substrates and 2-inch (010) single crystal substrates. The company has mastered the core technology of the entire chain of gallium oxide growth, processing, and epitaxy, and has obtained more than ten international and domestic invention patents, helping the domestic gallium oxide related industry break free from international monopolies and blockades, and providing customers with high-quality gallium oxide substrate products with completely independent intellectual property rights.